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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Emerging Lithographic Technologies II - TEMP: a software package for simulation of resist heating in electron-beam lithography
Cui, Zheng, Vladimirsky, YuliVolume:
3331
Year:
1998
Language:
english
DOI:
10.1117/12.309596
File:
PDF, 1.75 MB
english, 1998