SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Multilevel Interconnect Technology II - Characterization of pattern density and the metal stack composition on chlorine residues from the metal etch process
Loong, Sang Y., Lee, Hian K., Zhou, Mei-Sheng, Chan, Lap H., Premachandran, Vayalakkara, Graef, Mart, Patel, Divyesh N.Volume:
3508
Year:
1998
Language:
english
DOI:
10.1117/12.324025
File:
PDF, 1.77 MB
english, 1998