SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Spinnable and UV-patternable hybrid sol-gel silica glass for direct semiconductor dielectric layer manufacturing
Andrews, Mark P., Zhang, Ping, Najafi, S. Iraj, Chao, Keith K., Pasch, Nicholas F., Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350178
File:
PDF, 844 KB
english, 1999