![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Chemically amplified negative resist optimized for high-resolution x-ray lithography
Nakamura, Jiro, Kawai, Yoshio, Deguchi, Kimiyoshi, Oda, Masatoshi, Matsuda, Tadahito, Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350228
File:
PDF, 749 KB
english, 1999