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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Chemically amplified resists based on acrylate polymers containing ketal groups in the side chains
Kim, Jin-Baek, Park, Jong Jin, Jang, Ji Hyun, Kim, Jae-Young, Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350247
File:
PDF, 695 KB
english, 1999