SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Understanding systematic and random CD variations using predictive modeling techniques
Flagello, Donis G., van der Laan, Hans, van Schoot, Jan B., Bouchoms, Igor, Geh, Bernd, Van den Hove, LucVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354328
File:
PDF, 2.43 MB
english, 1999