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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Approach to pattern aspect ratio control
Thomas, Alan C., Zach, Franz X., Wong, Alfred K. K., Ferguson, Richard A., Samuels, Donald J., Longo, Rosemary, Zhu, John, Feild, Christopher, Van den Hove, LucVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354403
File:
PDF, 1.63 MB
english, 1999