SPIE Proceedings [SPIE Photomask and X-Ray Mask Technology VI - Yokohama, Japan (Tuesday 13 April 1999)] Photomask and X-Ray Mask Technology VI - Fabrication of MoSiON halftone masks using ZEP7000 for MEBES 4500
Maetoko, Kazuyuki, Tange, Koji, Fukuma, Hitoshi, Yoshioka, Nobuyuki, Kawada, Susumu, Ishizuka, Masahiko, Sasaki, Takaei, Sauer, Charles A., Morimoto, HiroakiVolume:
3748
Year:
1999
Language:
english
DOI:
10.1117/12.360216
File:
PDF, 704 KB
english, 1999