SPIE Proceedings [SPIE SPIE's International Symposium on Optical Science, Engineering, and Instrumentation - Denver, CO (Sunday 18 July 1999)] EUV, X-Ray, and Neutron Optics and Sources - Toward a high-average-power and debris-free soft x-ray source for microlithography pumped by a long-pulse excimer laser
Bollanti, Sarah, Di Lazzaro, Paolo, Flora, Francesco, Letardi, Tommaso, Marinai, Alessandro, Nottola, Alessandro, Vigli-Papadaki, Kostandia, Vitali, A., Bonfigli, Francesca, Lisi, Nicola, Palladino, LVolume:
3767
Year:
1999
Language:
english
DOI:
10.1117/12.371128
File:
PDF, 1.85 MB
english, 1999