SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Characterization of UV6 photoresist stabiliztion and implant masking for exclusive implementation in 180-nm device processing
Lysaght, Patrick S., Nguyen, Billy, Bersuker, Gennadi, Bennett, Joe, Hare, Tony, Doros, Theodore G., Beach, James V., Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388364
File:
PDF, 2.18 MB
english, 2000