SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - 0.13-μm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks
Chen, Yung-Tin, Lin, Chia-Hui, Lin, Hua Tai, Hsieh, Hung-Chang, Yu, Shinn Sheng, Yen, Anthony, Progler, Christopher J.Volume:
4000
Year:
2000
Language:
english
DOI:
10.1117/12.388927
File:
PDF, 4.01 MB
english, 2000