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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Process performance comparisons on 300-mm i-line steppers, DUV stepper, and DUV scanners
Schedel, Thorsten, Charles, Alain B., Ganz, Dietmar, Hornig, Steffen R., Hraschan, Guenther, Koestler, Wolfram, Maltabes, John G., Mautz, Karl E., Metzdorf, Thomas, Otto, Ralf, Schmidt, Sebastian, SchVolume:
4000
Year:
2000
Language:
english
DOI:
10.1117/12.389023
File:
PDF, 1.39 MB
english, 2000