SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Practical phase control technique for alternating phase-shift mask fabrication
Takahashi, Masahiko, Miyake, Akihiro, Saitou, Hidetaka, Miyashita, Hiroyuki, Murai, Shiaki M., Morimoto, HiroakiVolume:
4066
Year:
2000
Language:
english
DOI:
10.1117/12.392040
File:
PDF, 868 KB
english, 2000