SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Lithography for Semiconductor Manufacturing II - Manufacturing considerations for MEEF minimization and process window optimization for 180-nm contact holes
Kang, Doris, Robertson, Stewart A., Reilly, Michael T., Pavelchek, Edward K., Mack, Chris A., Stevenson, TomVolume:
4404
Year:
2001
Language:
english
DOI:
10.1117/12.425204
File:
PDF, 158 KB
english, 2001