SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Application of CD error budget analysis to ArF scanner performance
Renwick, Stephen P., Brown, Jay M., Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435700
File:
PDF, 106 KB
english, 2001