SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Performance data of a new 248-nm CD metrology tool proved on COG reticles and PSMs
Schlueter, Gerhard W., Steinberg, Walter, Whittey, John M., Dao, Giang T., Grenon, Brian J.Volume:
4562
Year:
2002
Language:
english
DOI:
10.1117/12.458314
File:
PDF, 563 KB
english, 2002