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SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making
Medeiros, David R., Petrillo, Karen E., Bucchignano, James, Angelopoulos, Marie, Huang, Wu-Song, Li, Wenjie, Moreau, Wayne M., Lang, Robert, Kwong, Ranee W., Magg, Christopher, Ashe, Brian, Dao, GiangVolume:
4562
Year:
2002
Language:
english
DOI:
10.1117/12.458334
File:
PDF, 255 KB
english, 2002