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SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Onium salt structure/property relationships in poly(4-tert-butyloxycarbonyloxystyrene) deep-UV resists
Schwartzkopf, George, Niazy, Nagla N., Das, Siddhartha, Surendran, Geetha, Covington, John B., Ito, HiroshiVolume:
1466
Year:
1991
Language:
english
DOI:
10.1117/12.46356
File:
PDF, 644 KB
english, 1991