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SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Fogging Effect Consideration in Mask Process at 50 KeV E-Beam Systems
Yang, Seung-Hune, Choi, Yo-Han, Park, Jong-Rak, Kim, Yong-Hoon, Choi, Sung-Woon, Yoon, Hee-Sun, Sohn, Jung-Min, Grenon, Brian J., Kimmel, Kurt R.Volume:
4889
Year:
2002
Language:
english
DOI:
10.1117/12.468100
File:
PDF, 327 KB
english, 2002