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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - High-resolution templates for step and flash imprint lithography
Resnick, Douglas J., Dauksher, William J., Mancini, David P., Nordquist, Kevin J., Ainley, Eric S., Gehoski, Kathleen A., Baker, Jeff H., Bailey, Todd C., Choi, Byung J., Johnson, Stephen C., SreenivaVolume:
4688
Year:
2002
Language:
english
DOI:
10.1117/12.472293
File:
PDF, 2.18 MB
english, 2002