SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - New PTB reflectometer for the characterization of large optics for the extreme-ultraviolet spectral region
Tuemmler, Johannes, Scholze, Frank, Brandt, Guido M., Meyer, Bernd, Scholz, Frank, Vogel, Katrin, Ulm, Gerhard, Poier, Michael, Klein, Udo, Diete, Wolfgang, Engelstad, Roxann L.Volume:
4688
Year:
2002
Language:
english
DOI:
10.1117/12.472307
File:
PDF, 509 KB
english, 2002