SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Atomic force microscopy for phase metrology of alternating-aperture phase-shift masks
Miller, Kirk, Todd, Bradley, Pinkerton, Tim, Herr, Daniel J. C.Volume:
4689
Year:
2002
Language:
english
DOI:
10.1117/12.473484
File:
PDF, 46 KB
english, 2002