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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Challenges of 50-nm gate process in alternating phase shifting lithography
Fang, Cheng Y., Hung, Kuei-Chun, Huang, Z. H., Lin, Benjamin S., Hsu, Shu-Hao, Yen, Yeong-Song, Yen, Paul P., Huang, Jiunn-Ren, Liu, Hua-Yu, Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474238
File:
PDF, 367 KB
english, 2002