SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Model-based OPC for phase-shifter edge lithography
Futatsuya, Hiroki, Chijimatsu, Tatsuo, Takayoshi, Minami, Tsujimura, Ryo, Komura, Yoshihisa, Ito, Yoshio, Asai, Satoru, Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474495
File:
PDF, 273 KB
english, 2002