SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Required performances of reticle inspection system for ArF lithography through analysis of defect printability study
Kim, Byung Gook, Tanaka, Keishi, Yoshioka, Nobuyuki, Takayama, Naohisa, Hatta, Keiichi, Murakami, Shingo, Otaki, Masao, Kawahira, HiroichiVolume:
4754
Year:
2002
Language:
english
DOI:
10.1117/12.476960
File:
PDF, 482 KB
english, 2002