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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - 22-nm lithography using near-field x rays
Engelstad, Roxann L., Bourdillon, Antony J., Williams, Gwyn P., Vladimirsky, Yuli, Boothroyd, Chris B.Volume:
5037
Year:
2003
Language:
english
DOI:
10.1117/12.484989
File:
PDF, 1.23 MB
english, 2003