SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Investigation of cyclopolymerization for ArF positive photoresist
Lee, Youngjoon, Fedynyshyn, Theodore H., Hashimoto, Kazuhiko, Fujishima, Hiroaki, Hanawa, Ryotaro, Uetani, YasunoriVolume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485064
File:
PDF, 476 KB
english, 2003