SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Reduction of image placement errors in EPL masks
Engelstad, Roxann L., Wood II, Obert R., Reu, Phillip L., Engelstad, Roxann L., Lovell, Edward G., Lercel, Michael J., Thiel, Carey W., Lawliss, Mark S., Mackay, R. S.Volume:
5037
Year:
2003
Language:
english
DOI:
10.1117/12.490136
File:
PDF, 438 KB
english, 2003