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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - High-accuracy simulation-based optical proximity correction
Keck, Martin C., Kimmel, Kurt R., Staud, Wolfgang, Henkel, Thomas, Ziebold, Ralf, Crell, Christian, Thiele, J÷rgVolume:
5256
Year:
2003
Language:
english
DOI:
10.1117/12.517462
File:
PDF, 207 KB
english, 2003