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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Electron-beam-assisted resist sidewall angle control and its applications
Chang, Jei-Wei, Sturtevant, John L., Chen, Chao-PengVolume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.530381
File:
PDF, 892 KB
english, 2004