SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara,...

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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Effect of inline dose and focus monitoring and control on post-etch CD

Dinu, Berta A., Silver, Richard M., Subramony, Venkatram, Lim, Pei Chin, Goh, Dawn, Eichelberger, Brad J., Chew, Kwong Boo, Monahan, Kevin M.
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Volume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.535241
File:
PDF, 220 KB
english, 2004
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