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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Novel reactions of quadricyclane: a new route to monomers for low-absorbing polymers in 157-nm photoresists
Marsella, John A., Sturtevant, John L., Abdourazak, Atteye H., Carr, Richard V. C., Markley, Thomas J., Robertson III, Eric A.Volume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.535613
File:
PDF, 1.19 MB
english, 2004