SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns
Lee, Sook, Smith, Bruce W., Hwang, Chan, Park, Dong-Woon, Kim, In-Sung, Kim, Ho-Chul, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-TaeVolume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.536280
File:
PDF, 438 KB
english, 2004