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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Data Analysis and Modeling for Process Control - Advanced module-based approach to effective CD prediction of sub-100nm patterns
Shin, Jangho, Tobin, Jr., Kenneth W., Kim, Insung, Hwang, Chan, Park, Dong-Woon, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-TaeVolume:
5378
Year:
2004
Language:
english
DOI:
10.1117/12.536345
File:
PDF, 221 KB
english, 2004