SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - 3D features analysis using spectroscopic scatterometry
Quintanilha, Richard, Silver, Richard M., Thony, Philippe, Henry, Daniel, Hazart, JeromeVolume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.537192
File:
PDF, 633 KB
english, 2004