SPIE Proceedings [SPIE Photonics Europe - Strasbourg, France (Monday 26 April 2004)] Optical Micro- and Nanometrology in Manufacturing Technology - Lateral error reduction in the 3D characterization of deep MOEMS devices using white light interference microscopy
Montgomery, Paul C., Gorecki, Christophe, Asundi, Anand K., Montaner, Denis, Manzardo, Omar, Herzig, Hans-PeterVolume:
5458
Year:
2004
Language:
english
DOI:
10.1117/12.545663
File:
PDF, 520 KB
english, 2004