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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Global CD uniformity improvement for CAR masks by adaptive post-exposure bake with CD measurement feedback
Berger, Lothar, Tanabe, Hiroyoshi, Saule, Werner, Dress, Peter, Gairing, Thomas M., Chen, C.-J., Lee, Hsin-Chang, Hsieh, Hung-ChangVolume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557714
File:
PDF, 406 KB
english, 2004