SPIE Proceedings [SPIE Dry Etch Technology - San J, United...

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SPIE Proceedings [SPIE Dry Etch Technology - San J, United States (Monday 9 September 1991)] Dry Etch Technology - Evaluation of silicon surface damage induced by plasma radiation

Yoneda, Masahiro, Kawai, K., Miyatake, Hiroshi, Fujiwara, Nobuo, Nishioka, K., Abe, Haruhiko, Ranadive, Deepak
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Volume:
1593
Year:
1992
Language:
english
DOI:
10.1117/12.56910
File:
PDF, 360 KB
english, 1992
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