SPIE Proceedings [SPIE Dry Etch Technology - San J, United States (Monday 9 September 1991)] Dry Etch Technology - Evaluation of silicon surface damage induced by plasma radiation
Yoneda, Masahiro, Kawai, K., Miyatake, Hiroshi, Fujiwara, Nobuo, Nishioka, K., Abe, Haruhiko, Ranadive, DeepakVolume:
1593
Year:
1992
Language:
english
DOI:
10.1117/12.56910
File:
PDF, 360 KB
english, 1992