SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Studies of dissolution inhibition mechanism of DNQ novolak resists: part III--secondary inhibition with quaternary ammonium salts in development process
Honda, Kenji, Beauchemin, Jr., Bernard T., Hurditch, Rodney J., Blakeney, Andrew J., Kokubo, Tadayoshi, Novembre, Anthony E.Volume:
1672
Year:
1992
Language:
english
DOI:
10.1117/12.59760
File:
PDF, 447 KB
english, 1992