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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Qualification of an integrated scatterometer for CD measurements of sub-100nm resist structures in a high-volume 300mm DRAM production environment
Marschner, Thomas, Silver, Richard M., Fleischer, Goeran, Fuchs, Stefan, Friedrich, Michael, Kramer, Uwe, Voigt, Matthias, Hetzer, DaveVolume:
5752
Year:
2005
Language:
english
DOI:
10.1117/12.598420
File:
PDF, 414 KB
english, 2005