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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Development of low damage mask making process on EUV mask with thin CrN buffer layer
Kureishi, Mitsuhiro, Mackay, R. Scott, Ohkubo, Ryo, Hosoya, Morio, Shoki, Tsutomu, Sakaya, Noriyuki, Kobayashi, Hideo, Nozawa, Osamu, Usui, Yoh-ichi, Nagarekawa, OsamuVolume:
5751
Year:
2005
Language:
english
DOI:
10.1117/12.598613
File:
PDF, 809 KB
english, 2005