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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Effects of wet-cleans and surface treatments on the adhesion of a photoresist to HDP-oxide substrate
Fu, Shih-Chi, Sturtevant, John L., Chen, Jieh-Jang, Shiu, Feng-Jia, Kuo, Ching-Sen, Shiau, Gwo-Yun, Tsia, Chia-Shiung, Wang, ChungVolume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.601435
File:
PDF, 372 KB
english, 2005