SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - The impact of mask topography on binary reticles at the 65nm node
Smith, Mark D., Smith, Bruce W., Graves, Trey, Byers, Jeffrey D., Mack, Chris A.Volume:
5754
Year:
2005
Language:
english
DOI:
10.1117/12.601523
File:
PDF, 106 KB
english, 2005