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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Three-dimensional rigorous simulation of EUV defective masks using modal method by Fourier expansion
Smaali, Rafik, Lercel, Michael J., Besacier, Maxime, Schiavone, PatrickVolume:
6151
Year:
2006
Language:
english
DOI:
10.1117/12.655495
File:
PDF, 1.18 MB
english, 2006