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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Process window OPC for reduced process variability and enhanced yield
Krasnoperova, Azalia, Flagello, Donis G., Culp, James A., Graur, Ioana, Mansfield, Scott, Al-Imam, Mohamed, Maaty, HeshamVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656835
File:
PDF, 327 KB
english, 2006