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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Data Analysis and Modeling for Process Control III - Dry-etch proximity function for model-based OPC beyond 65-nm node
Sato, Shunichiro, Emami, Iraj, Tobin, Jr., Kenneth W., Ozawa, Ken, Uesawa, FumikatsuVolume:
6155
Year:
2006
Language:
english
DOI:
10.1117/12.657043
File:
PDF, 1.38 MB
english, 2006