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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Unifying the RET design flow with portable modeling information
Sweis, Jason, Hoga, Morihisa, Staud, Wolf, Naber, Bob, Laidig, Tom, Van Denbroeke, DougVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681812
File:
PDF, 366 KB
english, 2006