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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Dissolution behavior of resist polymers studied by Quartz-Crystal-Microbalance method II
Toriumi, Minoru, Lin, Qinghuang, Okabe, Fumihiko, Kitayama, MasahikoVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.711926
File:
PDF, 294 KB
english, 2007