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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Setting MRC rules: balancing inspection capabilities, defect sensitivity, and OPC
Stobert, Ian, Archie, Chas N., Bruce, James, Gheith, Mohamed, Seoud, AhmedVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.712418
File:
PDF, 146 KB
english, 2007