SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Study of rigorous effects and polarization on phase shifting masks through simulations and in-die phase measurements
Lee, Kyung M., Archie, Chas N., Tavassoli, Malahat, Lau, Max, Baik, Kiho, Lieberman, Barry, Perlitz, Sascha, Buttgereit, Ute, Scherübl, ThomasVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.712908
File:
PDF, 281 KB
english, 2007